The International Conference on Ion Implantation Technology focuses on discussion of major challenges in current and emerging technologies related to implant/doping and annealing processes, device applications, equipment, metrology and modeling. The Conference offers an excellent opportunity for engineers and researchers in industry, research institutes and universities to present new results and to discuss ideas of new applications of ion implantation and annealing. The organizers welcome contributions from a wide range of topics, from fundamental research to industrial applications and equipment.
Website: https://smartconf.jp/content/iit2024
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